The photoinduced force microscope (PiFM) has a tunable IR laser coupled with its AFM capabilities. This allows for the study of IR absorption from 750-1800 cm-1 while collecting AFM images with ~10-50nm resolution.
Atomic force microscopy (AFM) is a scanning probe technique that utilizes a tip to obtain topographic information on nano and sometimes atomic scales. The sharp tip is attached to a cantilever, where the change in cantilever position can be tracked using a laser reflected off the back of the cantilever.
The ICON employs contact and non-contact scanning modes as well as a third technique developed by Bruker called “ScanAsyst” which applies a force curve at each pixel in order to obtain a hardness map of the surface. Most importantly, this method auto images, allowing a user to only set the size and location in order to get publishable images.
These AFM methods can be coupled with other techniques to measure topography in liquids, force spectroscopy, electrical and other properties of thin films.
The TFS Apreo variable-pressure SEM is a hi-resolution SEM capable of 1nm resolution and excellent back-scatter contrast.
Standard ETD in-chamber SE detector, T1 BSE detector and T2 in-column SE detector. Optionally equipped with immersion mode and T3 in-column SE detector, retractable directional back-scatter detector (DBS) with concentric and angular diode arrangements (available up to 50Pa chamber pressure), and sTEM 3+ transmission electron detector with concentric diodes for HAADF, BF, and custom DF imaging. Sample stage tilts to 90-deg. Variable pressure sample chamber can maintain 10-500 Pa water-vapor environment or high vacuum (10e-4 Pa). Has Maps4 automated large area mapping software. Equipped with Oxford Symmetry (EBSD) with EDS.
Up to 110mm long and 50mm tall. Vacuum compatible to 10e-4 Pa
By combining a high-efficiency Cu anode microfocus x-ray source and an extremely sensitive Pilatus 100K large-area 2D detector, the Bruker D8 powder x-ray diffractometer delivers some of the shortest acquisition times available. Additionally the 2D detection system gives unique information such as film orientation and strain, not easily achievable with traditional powder diffractometers. Since the instrument operates in a collimated beam geometry (0.05-2 mm beam diameter), only a very small amount of sample is necessary (less than 1 mg), and good diffraction can be collected from non-flat surfaces. The Pilatus 100K is capable of suppressing fluorescence from most samples (eg those containing Fe), and is not damaged by being hit with the main beam. This allows SAXS and GID measurements without a beamstop. Phase Identification, Phase Quantification (or % crystallinity), Texture, Stress, High Throughput Screening, MicroDiffraction, Mapping and more can be done faster and more easily on this system. The system also can be used with a Lynxeye-XET multi-strip 1D detector. This allows for higher resolution, Rietveld quality data collection, and x-ray reflectivity (XRR) measurements. A temperature controlled sample stage is also available for measurements from -100 to 350 °C with the sample in vacuum atmosphere.
Measurment of domain stability, melting temperature, and total thermodynamic determination of protein unfolding
MicroCal cap DSC liquid samples only volumes 400uL
Profilometer for measuring sub-nanoscale to millimeter scale film thicknesses, roughness, and thin film tensile and compressive stressed.
Diamond stylus with 2 um radius.
Dual beam UV/vis spectrophotometer, photodiode array detector, no thermal control
FEI XL830 dual-beam SEM-FIB is a single platform for both hi-resolution electron/ion imaging and site specific milling for a variety of applications. The electron beam allows observation of samples while the FIB accomplishes nano-machining of samples and devices for device editing, failure analysis, and sublayer observation.
Equipped with a field-emission SEM column (res~4nm) and a gallium focused ion beam (FIB). Detectors include Through Lens Detector (TLD), sTEM, and Continuous Dynode Electron Multiplier (CDEM) for secondary electron, backscattered electron, and secondary ion imaging. A stationary microprobe is available in the chamber for extraction of TEM lamella from wafer substrates. Beam chemistries include enhanced Si/SiOx etch and site specific platinum deposition.
Samples must be conductive and vacuum safe to 10^-8 mTorr. Chamber will accommodate an 6" wafer or multiple smaller pin-mount stubs. Mounted sample height must be below 8mm.
Oxford Insruments Symmetry Electron Back-Scatter Diffraction (EBSD) with Energy Dispersive Spectroscopy (EDS) allows grain analysis of samples in the Apreo SEM sample chamber.
EBSD pixel resolution up to 1244x1024 and 4000+ fps indexed. Used for crystal orientation mapping, sample texture analysis, characterization of grain boundaries, elemental analysis, and phase discrimination. Equipped with automated Large Area Mapping, Transmission Kikuchi Diffraction (TKD) and capable of capturing EBSPs with Megapixel resolution.
EBSD-quality polish and vacuum compatible to 10-5 Pa
The Oxford Instruments Energy Dispersive X-ray Spectrometer (EDS) system allows elemental microanalysis of samples in the dual beam sample chamber.
Demonstrated better than 125eV resolution at Mn-Ka. Aztec 3.2 with TrueLine, TrueMap, QuantLine, and automatic element deconvolution. Post-processing features are additionally available on the G44 analysis computer.
The Oxford Instruments Energy Dispersive X-ray Spectrometer (EDS) system allows elemental microanalysis of samples in the SEM sample chamber.
Demonstrated better than 127eV resolution at Mn-Ka. Aztec 3.2 with TrueLine, TrueMap, QuantLine, and automatic element deconvolution. Post-processing features are additionally available on the G44 analysis computer.
The EVOS FL Auto is a light microscope capable of capturing brightfield or fluorescence images. The instrument has light cubes for measuring DAPI, GFP and Texas Red. It is equipped with an automated stage and simple control interface for ease of use in capturing images.
The Horiba GD-Profiler 2 gives rapid depth-resolved elemental analysis with down to 5 nm resolution. The instrument uses an Ar plasma to sputter a 2 mm or 4 mm diameter crater into the sample, and uses atomic emission spectroscopy to identify the material being sputtered away. The sputtering rate is variable, but is approximately 10 microns per minute. Detectable elements are highlighted in the image at right.
The Alemnis Standard Assembly (ASA) allows mechanical testing of samples in the SEM chamber with video capture.
Test hardness, modulus of elasticity, residual stress, time-dependent creep and relaxation, fracture toughness and fatigue on thinfilms without removing the substrate. Max load 500mN.
Samples must be vacuum-compatible and no larger than 25mm diameter, 1cm tall.
X-ray Photoelectron Spectroscopy (XPS) (which is also known as ESCA) exploits the photoelectric effect to obtain information about the chemical composition of a surface. XPS can identify all elements (except H and He) present in the outermost 10 nm of a surface that are in concentrations greater than 0.1 atomic %. The elemental composition of a surface can be quantified (±10% or better). High-resolution XPS spectra can provide information about the molecular environment of a particular element (oxidation state, bonding atoms, etc.) Since the major components of the XPS systems are under computer control, automated data acquisition is possible allowing the instrument to be used 24/7.
The instrument is equipped with a monochromatic Al Kα x-ray source as well as non-monochromatic Al and Mg sources. Typically a 700x300 micron spot on the sample is analyzed, but the spot sizes can be decreased down to ~100 microns. Samples up to 1 x 9 cm can be measured. Special capabilities of the Kratos Axis Ultra DLD include ultraviolet photoelectron spectroscopy (UPS), XPS imaging, depth profiling using monoatomic argon, and non-destructive depth profiling of the outer 10 nm using angle-resolved XPS
Confocal Microscope for optical section of whole specimens.; Excitation at 458,477,488,514,543, and 643nm
Raman spectrometer with confocal microscope for characterization of bulk and nanoscale samples.
Laser sources include 514 nm and 784 nm. Automated sample stage. CCD detection.
Currently no restrictions.
The Leica EM ACE600 is a sample preparation tool that applies conductive coatings to SEM samples prior to analysis.
Equipped with 2 source heads: sputter and carbon thread. The default sputter target is platinum, but iridium is also available. Three sample stages are available to users: pin-mount stubs, glass slide, and a planetary drive stage. Stage is motorized in Z, Tilt, and Rotation. Quartz monitor reports film thickness after recipe completion.
Samples must be vacuum compatible with the process requirement.
Field Emission SEM with secondary and back-scatter electron imaging and Energy Dispersive X-ray Spectroscopy.
The Sirion XL30 scanning electron microscope provides high resolution, low kV secondary electron and backscatter imaging from well-prepared samples using through-lens-detection technology. For standard gold on carbon substrate resolution is 3 nm at accelerating voltages of 1 kV - 30 kV.
Samples must be conductive and vacuum safe to 10^-8 mTorr. Chamber will accommodate up to 5 cm diameter and 2 cm tall.
Picosecond vibrational sum frequency generation spectroscopy system.
A 532 nm visible beam is generated by frequency doubling of a short-pulsed Nd:YAG laser (32 ps pulse width and 50 Hz repetition rate), which also functions as the pump for an OPG/OPA/DFG system that generates a tunable IR beam (extended to ~1000 wavenumbers).
The T200 allows for characterizing molecular interactions including: kinetics, affinity, specificity, concentration, immunogenicity, epitope binning, and transition-state thermodynamics.
Sample holder supports up to 78 sample/reagent vials. Analysis time per sample is typically 2-15 minutes. Analysis temperature ranges from 4-45 °C. System includes 4 separate flow cells.
The S-Probe is equipped with a monochromatic Al Kα x-ray source. The typical x-ray spot size used for analysis is 800 microns, but smaller spot size analysis is possible down to 50 microns. Samples up to 3x3 cm can be measured.
200 kV HR transmission electron microscope with DF scanning capabilities (S/TEM), EDAX Elite-T EDS, diffraction, and tomography. Supplied with a Gatan Ultrascan CCD digital camera. Point to point resolution is 0.24 nm with information limit of 0.102 nm.
Contact Ellen Lavoie at email@example.com for training or questions.
Tecnai G2 F20 Twin TEM is a highly advanced, state-of-the-art 200 kV transmission electron microscope with an unrivaled task-oriented user interface. Running under Windows XP operating system, it offers high performance with versatility and high productivity with ease of use. With 0.27 nm point to point resolution and 0.144 information limit, the TEM allows for imaging of a variety of samples from atoms to large features such as biological cells. This microscope is mainly used for soft materialsCapabilities of the MAF Tecnai TEM include:SAD or CBED diffraction, cryo transfer and holder, and in-situ liquid holder use. The TEM is equipped with an FEI Eagle CCD camera. Complimented to the system is an FEI Vitrobot 2 for cryo sample preparation.
ToF-SIMS is a surface analytical method that provides chemically specific information about the upper 1-2 nm of a surface. The IONTOF TOF.SIMS 5 is capable of producing high mass resolution spectra (m/detlaM ~ 6000-10000) and high spatial resolution images (< 1 micron edge resolution) of any surface that can be placed in an ultra high vacuum environment. The TOF.SIMS 5 also has a gas cluster ion beam (GCIB) for sputtering which enables depth profiling of organic materials.
The SIMS process is initiated by bombarding the surface of a solid sample with an energetic beam of ions (1-50 keV). This primary ion beam bombardment results in the ejection of atoms and molecular fragments from the surface region. Only a small percentage of the emitted fragments are positive or negative ions. It is these secondary ions that are mass analyzed in SIMS. In static mode of ToF SIMS, the primary ion beam is maintained at a very low fluence (typically less than 1012 ions/cm2) so that secondary ions are not emitted from an area damaged previously by another primary ion, resulting in the emission of molecular fragments from organic and biological materials. The structure and composition of these fragments is directly related to the molecular structure of the surface they were emitted from. Thus, analysis of the type and amounts of secondary ions emitted from a sample under static SIMS conditions provides information about the molecular surface structure of organic and biological materials. When used in conjunction with other surface sensitive techniques such as electron spectroscopy for chemical analysis (ESCA), a detailed understanding of surface structure and composition can be obtained.
A key feature of modern, state-of-the-art SIMS systems is the ToF analyzer used to detect the secondary ions. The ions are extracted from the sample and accelerated into the field-free analyzer with a common energy (but different velocities). The difference in velocities means the smaller ions move through the analyzer more rapidly than the larger ions, providing mass separation of the ions. When the secondary ions strike the detector their masses are determined from the time it took them to travel through the analyzer. Overall, the combination of the ToF analyzer with the static SIMS process results in a powerful surface analysis technique.
Information provided by ToF-SIMS:
Special ToF-SIMS capabilities at our facility:
All samples must be vacuum compatible. Samples containing PDMS are not allowed unless specific permission is obtained prior to analysis. An extra fee will be charged for analysis of PDMS materials to cover cleaning and checking of the system.
Femtosecond laser system with transient absorption and streak camera detectors capable of measuring photoexcited spectra, photoluminescence, and kinetics of thin film and solution phase samples.
The output of the Libra (800 nm, 1 kHz, 40 fs) has the capability to pump 1 or 2 OPAs with outputs ranging from the UV to IR, as well as generate a broadband probe from the UV to NIR. The Helios system allows for transient absorption detection in the fs-ns range, while the EOS system extends from the ns-ms range. Streak camera allows for detection of photoluminescence in the ps-ms time range.
Automatic cutting microtome for either wet or dry sectioning of 20 nm-several microns.
Full training including preparation of samples and use of diamond knife for ultrathin sectioning samples is offered.
Used for determination of thicknesses and optical parameters of thin films and multilayers; Spectral range: 210-1700nm; Spot size: normal > 1.5 mm, focused <150 μm; Sample mapping; Heating option: to 300 °C
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