Molecular Analysis Facilty Tool

ToF-SIMS – IONTOF 5

Make/Model: IONTOF TOF.SIMS 5
Location: MolES G42H
ToF-SIMS is a surface analytical method that provides chemically specific information about the upper 1-2 nm of a surface. The IONTOF TOF.SIMS 5 is capable of producing high mass resolution spectra (m/detlaM ~ 6000-10000) and high spatial resolution images (< 1 micron edge resolution) of any surface that can be placed in an ultra high vacuum environment. The TOF.SIMS 5 also has a gas cluster ion beam (GCIB) for sputtering which enables depth profiling of organic materials, perovskites, and some oxides.
  • Instrument Details
  • Example Data

Key Capabilities

  • Generation of detailed mass spectrum of the outermost 1-2 nm of a surface
  • 2D and 3D chemical imaging
  • Identification of structural units present at the surface, e.g. monomeric components and repeat units)
  • Contamination detection


Data Produced

  • High resolution spectrum of the outer surface
  • Image of the surface distribution of all detected species within the sampled area
  • Plots of z-distribution of detected species (for depth profiles)
  • Data is not directly quantitative, however relative differences differences in peak intensities are significant and representative of sample differences


Example Applications

  • Detection of contaminants
  • Identification of surface-active additives
  • Characterization of surface modification treatments
  • Examination of adsorbed/immobilized biomolecules
  • Determination of supramolecular structures
  • Chemical imaging of patterned surfaces


Compatible Samples

  • Any vacuum compatible material
  • Maximum sample size: 2.5 inches x 2.5 inches
  • Maximum sample thickness: ~1 cm
  • Samples containing PDMS are allowed on a case by case basis and may incur additional charges due to potential contamination issues


    • Additional Information