Molecular Analysis Facilty ToolToF-SIMS – IONTOF 5 Make/Model: IONTOF TOF.SIMS 5Location: MolES G42HToF-SIMS is a surface analytical method that provides chemically specific information about the upper 1-2 nm of a surface. The IONTOF TOF.SIMS 5 is capable of producing high mass resolution spectra (m/detlaM ~ 6000-10000) and high spatial resolution images (< 1 micron edge resolution) of any surface that can be placed in an ultra high vacuum environment. The TOF.SIMS 5 also has a gas cluster ion beam (GCIB) for sputtering which enables depth profiling of organic materials, perovskites, and some oxides. Instrument DetailsExample Data Key CapabilitiesGeneration of detailed mass spectrum of the outermost 1-2 nm of a surface 2D and 3D chemical imaging Identification of structural units present at the surface, e.g. monomeric components and repeat units) Contamination detection Data ProducedHigh resolution spectrum of the outer surface Image of the surface distribution of all detected species within the sampled area Plots of z-distribution of detected species (for depth profiles) Data is not directly quantitative, however relative differences differences in peak intensities are significant and representative of sample differences Example ApplicationsDetection of contaminants Identification of surface-active additives Characterization of surface modification treatments Examination of adsorbed/immobilized biomolecules Determination of supramolecular structures Chemical imaging of patterned surfaces Compatible SamplesAny vacuum compatible material Maximum sample size: 2.5 inches x 2.5 inches Maximum sample thickness: ~1 cm Samples containing PDMS are allowed on a case by case basis and may incur additional charges due to potential contamination issuesAdditional InformationVideo TutorialManufacturer's Website